EOS, the world’s leading provider of world-class 3D metal and polymer printing technology, has launched EOSPRINT 2.0, the latest version of the company’s advanced CAM environment for Additive Manufacturing (AM) solutions. Combined with applications for data preparation such as Siemens NX or Magics, the new EOS software provides an intuitive user interface, assuring customers greater freedom of parameter optimization for specific applications and simplifies part optimization by increasing Productivity and quality of components. EOSPRINT 2.0 is now available for EOS M 290 and EOS M 400 for metal materials. Next, it will also include support for all current EOS systems for metal materials and future polymers based systems.
“The innovations we’ve introduced to EOSPRINT are in line with market needs, particularly in the areas of ease of use, component quality, and productivity,” said Gerd Denninger, EOS Software Product Manager. “EOSPRINT 2.0 facilitates the early stages of the AM creation process and the advanced CAM environment for AM solutions enables designers to achieve unprecedented levels of quality and cost savings.”
Workflow-based design for ease of use
EOSPRINT 2.0 introduces a workflow-based approach to the graphical interface that reflects the CAM process for AM technology. This means that the software architecture is based on the data processing workflow for industrial 3D printing. Through simple click-based features, users can advance naturally through all the steps required to prepare the file for printing. EOSPRINT 2.0 is intuitive and quick to learn because the behavior of tools and features varies depending on the context of each workflow phase, simplifying the initial steps in the Additive Manufacturing process.
Superior productivity through segmentation of plans
The new floor segmenting capabilities allow you to use layers with different thicknesses in a single component, facilitating optimization for production. Segmentation functionality allows you to cut a component along a plan, so you can move it to Z level to define segments with different exposure requirements than quality and productivity. As a result, designers can define segments where high quality is required and assign optimized machines parameters for that purpose. Segments where speed is most important can be processed with optimized parameters for maximum productivity. This allows companies to find the ideal balance between component quality and creation time, significantly reducing production times. This is a key aspect of component manufacturing with Additive Manufacturing technology.
Open ParameterEditor module: more freedom for experienced users
More advanced material and processor developers can take advantage of the open EOS ParameterEditor module, included in EOSPRINT 2.0. ParameterEditor now offers an open and even wider set of tools, with unique parameter and exposure models, which gives customers greater freedom to optimize them for specific applications. The module also provides greater flexibility for optimizing and developing custom parameter sets. In addition to modifying all standard parameters, such as laser power or scanning speed, customers can configure even more advanced. For example, you can customize the order and number of exposure types and change the starting point and rotation angle for striped models.
Depending on the process parameters tested in depth by EOS, developers can independently create custom parameter sets. EOS ParameterEditor allows customers to develop their own materials and set of parameters to differentiate themselves from competition, increasing system productivity, reducing costs, or improving component quality. This feature is largely supported by the new available exposure models.
New exposure models for excellent component quality
Exposure patterns determine the laser paths during the AM creation process. In addition to the current exposure models, three new ones have been developed. An exposure model allows you to produce previously impossible components to achieve, avoiding support structures in areas that can not be removed. Two new exposure models allow you to reduce the creation time as well